- silicon dioxide etching
- 二氧化硅腐蚀
English-Chinese electricity dictionary (电气专业词典). 2013.
silicon dioxide etching
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silicon-dioxide etching — silicio dioksido ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. silicon dioxide etching vok. Siliziumdioxidätzung, f rus. травление диоксида кремния, n pranc. décapage de dioxyde de silicium, m … Radioelektronikos terminų žodynas
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Etching (glass) — Etching refers to the technique of creating art on the surface of glass by applying acidic, caustic, or abrasive substances. Traditionally this was done after the glass was blown or cast. In the 1920s a new mould etch process was invented, in… … Wikipedia
Industrial etching — For other uses, see Etching (disambiguation). Etched in ferric chloride for PCB production at home In industry, etching, also known as chemical milling, is the process of using acids, bases or other chemicals to dissolve unwanted materials such… … Wikipedia
Siliziumdioxidätzung — silicio dioksido ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. silicon dioxide etching vok. Siliziumdioxidätzung, f rus. травление диоксида кремния, n pranc. décapage de dioxyde de silicium, m … Radioelektronikos terminų žodynas
décapage de dioxyde de silicium — silicio dioksido ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. silicon dioxide etching vok. Siliziumdioxidätzung, f rus. травление диоксида кремния, n pranc. décapage de dioxyde de silicium, m … Radioelektronikos terminų žodynas
silicio dioksido ėsdinimas — statusas T sritis radioelektronika atitikmenys: angl. silicon dioxide etching vok. Siliziumdioxidätzung, f rus. травление диоксида кремния, n pranc. décapage de dioxyde de silicium, m … Radioelektronikos terminų žodynas
травление диоксида кремния — silicio dioksido ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. silicon dioxide etching vok. Siliziumdioxidätzung, f rus. травление диоксида кремния, n pranc. décapage de dioxyde de silicium, m … Radioelektronikos terminų žodynas
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
LOCOS — LOCOS, short for LOCal Oxidation of Silicon, is a microfabrication process where silicon dioxide is formed in selected areas on a silicon wafer having the Si SiO2 interface at a lower point than the rest of the silicon surface.This technology was … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
